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110年 - 110 國立中山大學_碩士班招生考試_電機系(甲組):半導體概論#104342
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5. Consider a GaAs pn junction initially biased at 0.7V at T = 300K. Assume the temperature increases to T = 330K. Calculate the change in the forward-bias voltage required to maintain a constant current through the junction. (20%)
相關申論題
1. Consider an n-channel MOSFET with 15um gate width and 2um gate length. The oxide capacitance is . If the MOSFET is operated in a non-saturation region with a drain-to-source voltage = 0.1V. The drain current ID = 35 μA at gate-to-source voltage = 2.5V, ID = 75 μA. Determine the (a) electron mobility (b) threshold voltage (20%)
#441704
2. Consider a contact between tungsten and n-type GaAs. The metal work function of tungsten is 4.55 V. Assume the GaAs is doped to a concentration of and the metal-semiconductor diode is operated under zero bias. Determine the (a) theoretical barrier height (b) built-in potential barrier (c) maximum electric field (20%)
#441705
3. An npn silicon (Er = 11.9) bipolar transistor (shown in Fig. 1) at T = 300K has uniform dopings of . The transistor is operating in the inverse- active mode with = 0.565 V. (a) Determine the minority carrier concentrations at x = xB and x" = 0(b) If the metallurgical base width is 1.1 um, determine the neutral base width (20%)
#441706
4. Consider an n-type semiconductor at T = 300K in thermal equilibrium. Assume that the donor concentration varies as over the range and L = 10 μm. (a) Determine the electric field as a function of x for 0 ≤x ≤ L(b) Calculate the potential difference x = 0 and x = L (with the potential at x = 0 being positive with respect to that at x = L) (20%)
#441707
5. Consider the p'n junction of a uniformly doped silicon n-channel JFET has doping concentrations of NA = and ND = at T = 300K. The metallurgical channel thickness is 0.8 μm. Determine the built-in potential barrier and the pinchoff voltage of the JFET. (20%)
#471392
4. A solar cell under an illumination of 80 W/Im2 has a short circuit current of 40 mA and an open circuit output voltage of 0.55V. What are the short circuit current and open circuit voltages when the light intensity is halved? (20%)
#471391
3. Calculate the maximum width of surface depletion region for a metal-SiO2-Si capacitor having NA=.(20%)
#471390
(b) An electric field of 3.5 x105 V/Im is needed to reach the saturation region. Find the bias voltage. (10%)
#471389
(a) Calculate the value of ND with an intrinsic region thickness of 20 Jum, and a permitted △E of 105 V/Im. △E is the change in electric field across the depletion region. (10%)
#471388
(b) Find the Fermi level. (10%) (Note: Sketch the band diagram and mark Ec, Ev, EF and Ei; indicate clearly the location of the Fermi level with respect to intrinsic level.)
#471387
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